Detections: H2O
Gas Type: UHP • CR
This HALO QRP is designed to monitor moisture impurities in state-of-the-art semiconductor process tools at pressures as low as 1 Torr.
Available Background Gases
N2 • He • Ar • H2 • HCl
Features and Benefits
- Part-per-billion detection limits
- Calibration-free with zero drift
- No consumables or maintenance
- Works over a wide pressure range from 1 Torr to 1000 Torr
Applications
- Epitaxy
- Atomic Layer Deposition (ALD)
- MOCVD
Communication Interfaces
Ethernet, USB, RS-232, RS-485, 4-20mA analog, Modbus TCP (optional)
Options & Accessories
- Serani Max interface software
- Requires vacuum pump
- Corrosion-resistant model
